Comparative study of the diffused emitter formed using screen-printed phosphorus doping paste and POCl<inf>3</inf>source for silicon solar cells

In this work, we have studied the screen-printed doping paste emitter diffusion and benchmarked it against the de-facto standard phosphorus oxychloride based tube diffusion. Comparable sheet resistance uniformity and solar cell electrical parameters have been achieved in both types of diffusions. In addition, the advantage of spatial selectivity and non-requirement of the edge isolation step in the paste-diffusion makes the screen-printable paste-diffusion approach promising for industrial silicon wafer solar cells.