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HWCVD: A Potential Tool for Silicon-Based Thin Films and Nanostructures
Journal
Materials Horizons: From Nature to Nanomaterials
ISSN
25245384
Date Issued
2020-01-01
Author(s)
Dusane, Rajiv O.
Abstract
Hot-wire chemical vapour deposition technique is the latest tool in the series of low-temperature deposition of thin films by chemical vapour deposition. Since its successful implementation for the preparation of diamond-like films, it has been widely explored for semiconductor thin-film deposition in particular silicon-based thin films. This article gives a detailed report of our efforts to understand this process and its application for depositing thin films of amorphous and microcrystalline silicon as well as depositing silicon nanowires. We also demonstrate that these films and nanowires can be successfully used in devices like solar cells and micro-supercapacitors.